States of Particles in DC Magnetron Sputtering Deposition of Titanium Metallic
نویسندگان
چکیده
منابع مشابه
DEPOSITION OF THIN TiO2 FILMS BY DC MAGNETRON SPUTTERING METHOD
Sputter deposition process is another old technique being used in modern semiconductor industries. Sputtering is a process that can deposit TiO2 material on wafer/glass substrates. In this process target is connected to negative high voltage. Further argon gas is introduced into the chamber and is ionized to a positive charge. The positively charged argon atoms are attracted and strike the nega...
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ژورنال
عنوان ژورنال: Procedia Engineering
سال: 2012
ISSN: 1877-7058
DOI: 10.1016/j.proeng.2012.02.036